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US 10,704,160 B2Granted
Sample stage/holder for improved thermal and gas flow control at elevated growth temperatures
AssigneeArizona Board of Regents on behalf of Arizona State University
InventorsFranz A. Koeck, Robert J. Nemanich
Life of this patent
Estimating the term…
Abstract
Apparatuses and methods are provided for manufacturing diamond electronic devices. The apparatus includes a base comprising a water-block and a cover that at least partially covers the water-block. The apparatus includes a sample stage disposed on the base. The apparatus further includes a sample holder disposed on the sample stage and configured to accept a diamond substrate. The apparatus includes controlled thermal interfaces between water-block, sample stage, sample holder and diamond substrate.
Claims20
An apparatus, comprising:
- a base comprising a water-block and a cover that at least partially covers the water-block;
- a sample stage disposed on the base;
- and
- a sample holder disposed on the sample stage and comprising a pocket, the sample holder having at least one sidewall comprising an inner edge and an outer edge, with the inner edge of the at least one sidewall laterally bounding an upper portion of the pocket and a lower portion of the pocket, wherein the lower portion of the pocket is arranged below the upper portion of the pocket and is configured to accept a diamond substrate;
- wherein the inner edge of the at least one sidewall defines at least one inlet opening in the upper portion of the pocket, and the outer edge of the at least one sidewall defines at least one outlet opening;
- wherein the sample holder comprises at least one flow channel extending through the at least one sidewall, and the at least one flow channel extends from the at least one inlet opening to the at least one outlet opening.
3 more elements
An apparatus, comprising:
- a base comprising a fluid container and a cover that at least partially covers the fluid container;
- a sample stage holder disposed on the base, the sample stage holder comprising a sample holder having a pocket, the sample holder defining at least one sidewall comprising an inner edge and an outer edge, with the inner edge of the at least one sidewall laterally bounding an upper portion of the pocket and a lower portion of the pocket, wherein the lower portion of the pocket is arranged below the upper portion of the pocket and is configured to accept a diamond substrate;
- and
- a thermal interface between the base and the sample stage holder;
- wherein the inner edge of the at least one sidewall defines at least one inlet opening in the upper portion of the pocket, and the outer edge of the at least one sidewall defines at least one outlet opening;
- and
- wherein the sample holder comprises at least one flow channel extending through the at least one sidewall, and the at least one flow channel extends from the at least one inlet opening to the at least one outlet opening.
4 more elements
A plasma enhanced chemical vapor deposition (PECVD) reactor, comprising:
- a chamber surrounded at least partially by a reactor wall;
- a base disposed in the chamber, the base comprising a fluid container and a cover that at least partially covers the fluid container;
- a sample stage holder disposed on the base, the sample stage holder comprising a sample holder having a pocket, the sample holder having at least one sidewall comprising an inner edge and an outer edge, with the inner edge of the at least one sidewall laterally bounding an upper portion of the pocket and a lower portion of the pocket, wherein the lower portion of the pocket is arranged below the upper portion of the pocket and is configured to accept a diamond substrate;
- and
- a thermal interface between the base and the sample stage holder;
- wherein the inner edge of the at least one sidewall defines at least one inlet opening in the upper portion of the pocket, and the outer edge of the at least one sidewall defines at least one outlet opening;
- and
- wherein the sample holder comprises at least one flow channel extending through the at least one sidewall, and the at least one flow channel extends from the at least one inlet opening to the at least one outlet opening.
5 more elements
Dependencies are inferred from the claim text.