Process kit design for in-chamber heater and wafer rotating mechanism

A rotatable substrate support heater pedestal and process kit for supporting a substrate in a process chamber, comprising:

• a primary substrate support having a support surface to support the substrate during processing, where the substrate support heater pedestal includes a shaft connected to an actuator to move the substrate support heater pedestal vertically and rotationally about an axis of the shaft;
• and
• the process kit comprising:
• an upper edge ring including an integrally formed top ledge and skirt, wherein the skirt extends downward from the top ledge, wherein the top ledge of the upper edge ring is configured to support the substrate in a spaced-apart relation to a support surface of the substrate support heater pedestal to facilitate repositioning of the substrate relative to the support surface of the substrate support heater pedestal, wherein the upper edge ring includes one or more alignment holes, and wherein the upper edge ring includes one or more alignment tabs that extend downward from a lower surface of the top ledge;
• and
• a lower edge ring that at least partially supports the upper edge ring and aligns the upper edge ring with the substrate support heater pedestal when the substrate support heater pedestal is in a raised processing position, wherein the lower edge ring is disposed entirely within the inner diameter of the skirt, wherein the lower edge ring includes a plurality of cone cut outs disposed on a top surface of the lower edge ring, wherein the lower edge ring includes a plurality of angled cut outs formed on an outer diameter of the lower edge ring, wherein the plurality of angled cut outs are spaced equidistantly apart, and wherein the one or more alignment tabs of the upper edge are disposed in a corresponding number of the plurality of angled cut outs formed in the lower edge ring when the substrate support heater pedestal is in a raised processing position;
• and
• a shadow ring that couples with the upper edge ring when the substrate support heater pedestal is in a raised processing position, wherein the shadow ring includes one or more alignment pins that extend downward from a lower surface of the shadow ring and through the corresponding one or more alignment holes of the upper edge ring and into the plurality of cone cut outs disposed on the top surface of the lower edge ring, such that the upper edge ring, lower edge ring, and shadow ring are all in alignment when the substrate support heater pedestal is in a raised processing position.

A process kit for use with a rotatable substrate support heater pedestal for supporting a substrate in a process chamber, comprising:

• an upper edge ring including an integrally formed top ledge and skirt, wherein the skirt extends downward from the top ledge, and wherein the upper edge ring includes one or more alignment holes;
• a lower edge ring that at least partially supports the upper edge ring and aligns the upper edge ring with the substrate support heater pedestal when the substrate support heater pedestal is in a raised processing position, wherein the lower edge ring is disposed entirely within the inner diameter of the skirt, and wherein the lower edge ring includes a plurality of cone cut outs disposed on a top surface of the lower edge ring;
• a bottom plate disposed on a bottom of the process chamber that supports the upper edge ring when the substrate support heater pedestal is in a lowered non-processing position;
• and
• a shadow ring that couples with the upper edge ring when the substrate support heater pedestal is in a raised processing position, wherein the shadow ring includes one or more alignment pins that extend downward from a lower surface of the shadow ring and through the corresponding one or more alignment holes of the upper edge ring and into the plurality of cone cut outs disposed on the top surface of the lower edge ring, such that the upper edge ring, lower edge ring, and shadow ring are all in alignment when the substrate support heater pedestal is in a raised processing position.