Polishing composition
AssigneeFujimi Incorporated
InventorsYukinobu Yoshizaki, Koichi Sakabe, Yusuke Kadohashi
Life of this patent
Estimating the term…
Abstract
To provide a technology by which, on the occasion of polishing an object to be polished including: (a) material having silicon-nitrogen bonds; and (b) other material, the ratio of the polishing speed for the material (a) with respect to the polishing speed for the material (b) can be increased. The polishing composition of the present invention is a polishing composition used for polishing an object to be polished including: (a) material having silicon-nitrogen bonds; and (b) other material, the polishing composition including: an organic acid-immobilized silica; and a particular selection ratio improver for increasing the ratio of the polishing speed for the material (a) with respect to the polishing speed for the material (b).
Claims11
A polishing composition used for polishing an object to be polished including (a) material having silicon-nitrogen bonds;
- and (b) other material, the polishing composition comprising:
- an organic acid-immobilized silica;
- and
- a selection ratio improver capable of improving the ratio of the polishing speed for the material (a) with respect to the polishing speed for the material (b),
- wherein the selection ratio improver is
- (i) a compound represented by at least one of the following Formula 1 and the following Formula 2:
- wherein R1, R2, R3, and R4 each independently represent a substituted or unsubstituted alkyl group having 1 to 20 carbon atoms, or a substituted or unsubstituted aryl group having 6 to 20 carbon atoms;
- (ii) a polymer having a constituent unit derived from an unsaturated carboxylic acid;
- or
- (iii) a compound represented by the following Formula 3:
- wherein R5 represents a substituted or unsubstituted branched alkyl group having 3 to 20 carbon atoms, or is represented by the following Formula 4:
- —(OE)nOR6 [Formula 4]
- wherein E represents an alkylene group having 1 to 3 carbon atoms;
- R6 represents a substituted or unsubstituted branched alkyl group having 3 to 20 carbon atoms, or an aryl group having a branched alkyl group having 3 to 20 carbon atoms;
- n is 2 to 100;
- provided that a plurality of E may be identical with or different from each other;
- and
- wherein the selection ratio improver may be in the form of a salt.
A method for improving the ratio of the polishing speed for material (a) with respect to the polishing speed for material (b), on the occasion of polishing an object to be polished including:
- (a) material having silicon-nitrogen bonds;
- and (b) other material, using a polishing composition, the method comprising incorporating:
- an organic acid-immobilized silica;
- and
- a selection ratio improver capable of improving the ratio of the polishing speed for the material (a) with respect to the polishing speed for the material (b) into the polishing composition, wherein the selection ratio improver is:
- (i) a compound represented by at least one of the following Formula 1 and the following Formula 2:
- wherein R1, R2, R3, and R4 each independently represent a substituted or unsubstituted alkyl group having 1 to 20 carbon atoms, or a substituted or unsubstituted aryl group having 6 to 20 carbon atoms;
- (ii) a polymer having a constituent unit derived from an unsaturated carboxylic acid;
- or
- (iii) a compound represented by the following Formula 3:
- wherein R5 represents a substituted or unsubstituted branched alkyl group having 3 to 20 carbon atoms, or is represented by the following moiety:
- —(OE)nOR6
- wherein E represents an alkylene group having 1 to 3 carbon atoms;
- R6 represents a substituted or unsubstituted branched alkyl group having 3 to 20 carbon atoms, or an aryl group having a branched alkyl group having 3 to 20 carbon atoms;
- n is from 2 to 100;
- provided that a plurality of E may be identical with or different from each other;
- and
- wherein the selection ratio improver may be in the form of a salt.
Dependencies are inferred from the claim text.