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US 10,702,893 B2Granted
Cleaning compositions for removing residues on semiconductor substrates
AssigneeFujifilm Electronic Materials U.S.A., Inc.
InventorsJoseph Gregory McAlpin, Thomas Dory
Life of this patent
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Abstract
This disclosure relates to a cleaning composition that contains 1) at least one redox agent; 2) at least one water soluble organic solvent; 3) at least one metal-containing additive; 4) at least one cyclic amine, and 5) water.
Claims33
A cleaning composition, comprising:
- 1) at least one redox agent;
- 2) at least one water soluble organic solvent;
- 3) at least one metal-containing additive in an amount from about 0.001% by weight to about 0.5% by weight of the composition;
- 4) at least one cyclic amine;
- and
- 5) water.
3 more elements
A cleaning composition, comprising:
- 1) at least one redox agent
- 2) at least one water soluble organic solvent
- 3) at least one metal-containing additive;
- 4) at least one cyclic amine;
- 5) at least one sulfur-containing additive;
- and
- 6) water;
- wherein the sulfur-containing additive comprises 3-amino-5-mercapto-1H-1,2,4-triazole, β-mercaptoethanol, 3-amino-5-methylthio-1H-1,2,4-triazole, 1-phenyl-1H-tetrazole-5-thiol, 4-methyl-4H-1,2,4-triazole-3-thiol, 2-pyridinethiol, or 3-mercapto-propionic acid.
5 more elements
Dependencies are inferred from the claim text.