Dual stripper with water sweep gas

A contaminant removal subsystem, comprising:

• a first gas-liquid contactor-separator;
• a second gas-liquid contactor-separator downstream of the first gas-liquid contactor-separator;
• and
• a third gas-liquid contactor-separator downstream of the second gas-liquid contactor-separator;
• wherein the first gas-liquid contactor-separator is configured to:
• receive a clean absorbent liquid;
• and
• discharge a used absorbent liquid;
• wherein the second gas-liquid contactor-separator is configured to:
• receive the used absorbent liquid discharged from the first gas-liquid contactor-separator;
• discharge a first contaminant, from the used liquid absorbent, for recovery and reuse;
• and
• discharge partially regenerated absorbent liquid;
• wherein the third gas-liquid contactor-separator is configured to:
• receive the partially regenerated absorbent liquid discharged from the second gas-liquid contactor-separator;
• receive a sweep gas;
• and
• discharge a second contaminant, from the partially regenerated liquid absorbent, for recovery and reuse.

A contaminant removal subsystem, comprising:

• a scrubber;
• a first stripper downstream of the scrubber;
• a second stripper downstream of the first stripper;
• and
• a water vaporizer downstream of the first stripper;
• wherein the first stripper is configured to discharge a first contaminant for recovery and reuse;
• wherein the second stripper is configured to discharge a second contaminant for recovery and reuse;
• wherein the water vaporizer is configured to provide a sweep gas to the first stripper;
• and
• wherein the scrubber is configured to discharge a sweep gas to the second stripper.