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US 10,656,137 B2Granted
Method for producing a nano-gap in a brittle film assisted by a stabilizing substrate
OwnerEthan Pfeifferinventor
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Abstract
This application discloses a method for developing a conductive nano-gap. The first step can comprise depositing a brittle material on a substrate. Next, a conductive graphene layer can be deposited at the surface of the brittle material. Lastly, a crack can be propagated through the brittle material and the graphene using a force, the crack a nano-gap.
Claims19
A method for developing a nano-gap comprising
- depositing a brittle material on a substrate;
- depositing a conductive graphene layer at the surface of said brittle material;
- placing one or more indentions on said brittle material to mark one or more positions on a single crack to be formed;
- propagating a single crack through said brittle material and said graphene using a force, said crack 400 nano-meters or less, a first side of said crack having a first height C1, and a second side of said crack having a second height C2;
- and
- bending at said crack on said first side at an angle l1 to reduce said crack by a first distance, and on said second side at an angle l2, to reduce said crack by a second distance, to form a nanogap, said first distance equal to C1 cos(l1), said second distance equal to C2 cos(l2), said bending occurring only at said single crack.
3 more elements
Dependencies are inferred from the claim text.