Method for preparing a barrier film
AssigneeLG Chem, Ltd.
InventorsHee Wang Yang, Jang Yeon Hwang, Seong Hwan Lee
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Abstract
The present application relates to a method for preparing a barrier film. The present application can provide a method for preparing a barrier film having excellent barrier characteristics and optical performances. The barrier film produced by the method of the present application can be effectively used not only for packaging materials of as foods or medicines, and the like, but also for various applications, such as members for FPDs (flat panel displays) such as LCDs (Liquid Crystal Displays) or solar cells, substrates for electronic papers or OLEDs (Organic Light Emitting Diodes), or sealing films.
Claims11
A method for preparing a water vapor transmission barrier film, the method comprising:
- coating a composition comprising an amine catalyst and a polysilazane on a base layer via a wet coating process to form a barrier layer, wherein:
- the amine catalyst is ammonia, ammonium hydroxide, ammonium chloride, trialkylamine, dialkylamine, monoalkyl amine, dialkanolamine, dialkylalkanolamine, trialkanolamine or dialkylaminoalkyl trialkoxysilane;
- and
- the amine catalyst is present in an amount within a range of 0.1 to 10 parts by weight relative to 100 parts by weight of the polysilazane;
- and
- subjecting the barrier layer to a curing process that includes performing a plasma hardening treatment comprising plasma-treating a surface of the barrier layer containing the polysilazane and the amine catalyst in a processing space in which water vapor, a discharge gas, and oxygen as a reaction gas are injected resulting in maintaining a vapor pressure of water vapor in the processing space at about 5% or more to cause oxidation of the polysilazane whereby SiN units of the polysilazane are converted into Si—O units in a thickness direction to layer satisfy Equation 2 below thereby yielding the water vapor transmission barrier film:
- 0.75≤d/(c+d)≤0.97 [Equation 2]
- wherein:
- c is the number of Si—N units present in the barrier layer after the plasma hardening treatment, and
- d is the number of Si—O units present in the barrier layer after the plasma hardening treatment.
Dependencies are inferred from the claim text.