Metallic layer comprising alkali metal and second metal
AssigneeNovaled GmbH
InventorsTomas Kalisz, Francois Cardinali, Jerome Ganier, Uwe Gölfert, Vygintas Jankus, Carsten Rothe, Benjamin Schulze, Steffen Willmann
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Abstract
The present invention relates to a metallic layer adjacent to a semiconducting layer comprising a substantially covalent matrix material, the metallic layer comprising at least one first metal and at least one second metal, wherein a) the first metal is selected from the group consisting of Li, Na, K, Rb, Cs; and b) the second metal is selected from the group consisting of Zn, Hg, Cd, Te, electronic devices comprising such materials and process for preparing the same.
Claims21
A metallic layer adjacent to a semiconducting layer comprising a substantially covalent matrix material, the metallic layer comprising at least one first metal and at least one second metal, wherein
- a) the first metal is selected from the group consisting of Li, Na, K, Rb, and Cs;
- and
- b) the second metal is selected from the group consisting of Zn, Hg, Cd, and Te,
- wherein the metallic layer is substantially isotropic, and
- wherein the at least one first metal and the at least one second metal are present in the metallic layer at a total amount of at least 90 wt %, based on the weight of the metallic layer.
Dependencies are inferred from the claim text.