Production method of capacitor structure, capacitor structure, and sensor

A production method of a capacitor structure, wherein the production method comprises:

• forming a bottom electrode on a substrate;
• forming a sacrificial layer, which covers at least part of the bottom electrode, on the substrate;
• forming a top electrode, which traverses the bottom electrode and covers at least part of the sacrificial layer, on the substrate, such that a sacrificial layer is present at a part where an orthographic projection of the top electrode on the substrate and an orthographic projection of the bottom electrode on the substrate overlap;
• and
• removing the sacrificial layer with a sacrificial layer removing solution to form an air gap,
• wherein:
• said forming a bottom electrode on a substrate is performed by a printing process;
• said forming a sacrificial layer, which covers at least one part of the bottom electrode, on the substrate is performed by a first coating process;
• said forming a top electrode, which traverses the bottom electrode and covers at least one part of the sacrificial layer, on the substrate is performed by a second coating process;
• and
• said removing the sacrificial layer with a sacrificial layer removing solution is performed by placing the substrate with the bottom electrode, the sacrificial layer, and the top electrode formed thereon in the sacrificial layer removing solution, and
• wherein the first coating process comprises:
• attaching a first mask layer comprising a first hollowed-out region onto the substrate with the bottom electrode formed thereon, such that an orthographic projection of the first hollowed-out region on the substrate and an orthographic projection of the sacrificial layer to be formed on the substrate overlap;
• forming the sacrificial layer by a coating process in the first hollowed-out region;
• and
• removing the first mask layer from the substrate.