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US 10,651,219 B2Granted
Image sensor
AssigneeSamsung Electronics Co., Ltd.
InventorsSung Soo Choi, Kyung Ho Lee
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Abstract
An image sensor and a method for fabricating the same are provided, in which the image sensor includes a substrate including a first sensing region having a photoelectric device therein, a boundary isolation film partitioning the first sensing region, an inner reflection pattern film within the substrate in the sensing region, an infrared filter on the substrate, and a micro lens on the infrared filter.
Claims19
An image sensor comprising:
- a first sensing region having a color filter;
- a second sensing region;
- a side anti-reflection film between the first sensing region and the second sensing region;
- a boundary isolation trench having a first length from a top surface of a substrate and disposed between the first sensing region and the second sensing region;
- a boundary isolation film filling the boundary isolation trench;
- a first inner reflection pattern film having a second length from the top surface of the substrate and disposed between a first boundary of the second sensing region and a second boundary of the second sensing region;
- and
- a planarizing film on the top surface of the substrate,
- wherein the second length is shorter than the first length,
- wherein the planarizing film includes a silicon nitride, and
- wherein the color filter is disposed on the planarizing film, and a bottom surface of the color filter is coplanar with a bottom surface of the side anti-reflection film.
8 more elements
An image sensor, comprising
- a first sensing region having a color filter;
- a second sensing region;
- a side anti-reflection film between the first sensing region and the second sensing region;
- a boundary isolation trench having a first length from a top surface of a substrate and disposed between the first sensing region and the second sensing region;
- a boundary isolation film filling the boundary isolation trench;
- an inner reflection pattern film having a second length from the top surface of the substrate and disposed between a first boundary of the second sensing region and a second boundary of the second sensing region;
- and
- a first planarizing film on the top surface of the substrate,
- wherein the second length is shorter than the first length,
- wherein the inner reflection pattern film includes a hafnium oxide, and
- wherein the color filter is disposed on the first planarizing film, and a bottom surface of the color filter is coplanar with a bottom surface of the side anti-reflection film.
8 more elements
Dependencies are inferred from the claim text.