Method of manufacturing semiconductor device by setting process chamber to maintenance enable state

A method of manufacturing a semiconductor device comprising:

• (a) transferring a substrate from a storage container storing one or more substrates including the substrate to a process chamber, and performing a substrate processing;
• (b) receiving maintenance reservation information of the process chamber;
• and
• (c) continuously performing the substrate processing after the maintenance reservation information is received in (b) until the substrate processing in the process chamber related to the maintenance reservation information is completed, stopping the one or more substrates from being transferred into the process chamber, and thereafter setting the process chamber to a maintenance enable state;
• (d) performing a notification that a maintenance process is reserved after the maintenance reservation information is received in (b);
• and
• (e) accepting a change in a maintenance timing within a predetermined range, wherein the maintenance timing is a timing when the process chamber enters into the maintenance enable state according to the maintenance reservation information,
• wherein the change is to advance the maintenance timing, and the maintenance timing is advanced at least by completing a currently proceeding substrate processing in the process chamber and withdrawing a currently transferring substrate so as to be stored again in the storage container.