US 10,651,064 B2 · Substrate treatment device and substrate treatment method

Abstract

A substrate treatment device includes: a substrate rotation part that horizontally holds and rotates a substrate; a nozzle that supplies a treatment liquid to a surface to be treated of the substrate rotated by the substrate rotation part; an imaging part that captures an image of an imaging area including a plurality of target areas in which a liquid film is formed when the treatment liquid is supplied to the substrate; and a detection part that refers to an imaging result of the imaging part and detects a treatment ending time point of each of the target areas based on a change in luminance value for each of the target areas. Further, the imaging area includes at least an area on a center side of the surface to be treated and an area on an outer circumferential side of the surface to be treated as the target areas.

Claims22

Dependent claims

A substrate treatment device comprising:

a substrate rotation part that horizontally holds and rotates a substrate;
a nozzle that supplies a treatment liquid to a surface to be treated of said substrate rotated by said substrate rotation part;
an imaging part that captures an image of an imaging area including a plurality of target areas in which a liquid film of said surface to be treated is formed when said treatment liquid is supplied to said substrate;
and
a detection part that refers to an imaging result of said imaging part and detects a treatment ending time point of each of said plurality of target areas based on a change in luminance value for each of said plurality of target areas,
wherein said imaging area includes at least an area on a center side of said surface to be treated and an area on an outer circumferential side of said surface to be treated as said plurality of target areas.

3 more elements

A substrate treatment method comprising:

a substrate rotation step of horizontally holding and rotating a substrate;
a supply step of supplying a treatment liquid to a surface to be treated of said substrate rotated by said substrate rotation step;
an imaging step of capturing an image of an imaging area including a plurality of target areas in which a liquid film of said surface to be treated is formed when said treatment liquid is supplied to said substrate;
and
a detection step of referring to an imaging result in said imaging step and detecting a treatment ending time point of each of said plurality of target areas based on a change in luminance value for each of said plurality of target areas,
wherein said imaging area includes at least an area on a center side of said surface to be treated and an area on an outer circumferential side of said surface to be treated as said plurality of target areas.

3 more elements

Dependencies are inferred from the claim text.

Substrate treatment device and substrate treatment method

Life of this patent

Substrate treatment device and substrate treatment method

Life of this patent

Abstract

Claims22