Substrate treating method and substrate treating device
AssigneeSCREEN Holdings Co., Ltd.
InventorsYuji Yamaguchi, Masahiro Kimura
Life of this patent
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Abstract
A substrate treating method dries a substrate on a surface of which a predetermined pattern is formed. The substrate treating method includes: a washing step of washing the substrate by immersing the substrate into a washing liquid after the washing liquid is stored into the treating tank in a sealed chamber; a decompression step of decompressing an inside of the chamber; a lifting step of lifting the substrate from the washing liquid stored in the treating tank; a liquid discharge step of discharging the washing liquid from the treating tank; and a hydrophobing step of replacing an atmosphere in the chamber with a hydrophobic agent and performing a hydrophobing treatment on the surface of the substrate.
Claims16
A substrate treating method for drying a substrate on a surface of which a predetermined pattern is formed, the substrate treating method comprising:
- a washing step of washing the substrate by immersing the substrate into a washing liquid after the washing liquid is stored into the treating tank in a sealed chamber;
- a decompression step of decompressing an inside of the chamber after the washing step;
- a lifting step of lifting the substrate from the washing liquid stored in the treating tank in the decompression step;
- a liquid discharge step of discharging the washing liquid from the treating tank in the decompression step and after the lifting step;
- and
- a hydrophobing step of replacing an atmosphere in the chamber with a hydrophobic agent and performing a hydrophobing treatment on the surface of the substrate in the decompression step and after the liquid discharge step.
A substrate treating device that dries a substrate on a surface of which a predetermined pattern is formed, the substrate treating device comprising:
- a sealed chamber;
- a treating tank provided in the chamber and capable of washing the substrate by storing a washing liquid;
- a decompressing unit that decompresses an inside of the chamber after the washing of the substrate;
- a lifting unit that lifts the substrate from the washing liquid in the treating tank in a decompressing by the decompressing unit;
- a liquid discharge unit that discharges a washing liquid from the treating tank in the decompressing by the decompressing unit and after the lifting by the lifting unit;
- and
- a hydrophobing unit that replaces an atmosphere in the chamber with a hydrophobic agent after the liquid discharge unit discharges the washing liquid in the decompressing by the decompressing unit and after a discharging by the liquid discharge unit.
A substrate treating method for drying a substrate on a surface of which a predetermined pattern is formed, the substrate treating method comprising:
- a washing step of washing the substrate by immersing the substrate into a washing liquid after the washing liquid is stored into the treating tank in a sealed chamber;
- a decompression step of decompressing an inside of the chamber after the washing step;
- a first organic-solvent-atmosphere forming step of supplying an organic solvent in order to replace the atmosphere in the chamber with an organic solvent in the decompression step;
- a lifting step of lifting the substrate to the atmosphere in the chamber from the washing liquid stored in the treating tank in the first organic-solvent-atmosphere forming step;
- a liquid discharge step of discharging the washing liquid from the treating tank in the first organic-solvent-atmosphere forming step and after the lifting step;
- a hydrophobing step of replacing an atmosphere in the chamber with a hydrophobic agent and performing a hydrophobing treatment on the surface of the substrate in the decompression step and after the liquid discharge step;
- and
- a second organic-solvent-atmosphere forming step of replacing the atmosphere in the chamber with the organic solvent after the hydrophobing step.
A substrate treating device that dries a substrate on a surface of which a predetermined pattern is formed, the substrate treating device comprising:
- a sealed chamber;
- a treating tank provided in the chamber and capable of washing the substrate by storing a washing liquid;
- a decompressing unit that decompresses an inside of the chamber after the washing of the substrate;
- an organic solvent supplying unit that performs a first organic-solvent-atmosphere forming step of replacing the atmosphere in the chamber with an organic solvent after the washing of the substrate and in a decompression by the decompressing unit;
- a lifting unit that lifts the substrate to the atmosphere in the chamber from the washing liquid in the treating tank in the first organic-solvent-atmosphere forming step;
- a liquid discharge unit that discharges a washing liquid from the treating tank in the first organic-solvent-atmosphere forming step and after the lifting by the lifting unit;
- and
- a hydrophobing unit that replaces an atmosphere in the chamber with a hydrophobic agent and performing a hydrophobing treatment on the surface of the substrate in the decompression by the decompressing unit and a discharging by the liquid discharge unit;
- wherein the organic solvent supplying unit performs a second organic-solvent-atmosphere forming step of replacing the atmosphere in the chamber with an organic solvent after the hydrophobing treatment.
Dependencies are inferred from the claim text.