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US 10,651,058 B2Granted
Substrate processing method and substrate processing apparatus
AssigneeSCREEN Holdings Co., Ltd.
InventorsHitoshi Nakai, Yasunori Kanematsu
Life of this patent
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Abstract
A substrate processing method includes a substrate holding step of horizontally holding a substrate having a first major surface and a second major surface at an opposite side of the first major surface, a coating film forming step of supplying a coating agent to the first major surface to form a sublimating coating film which covers the first major surface, and a coating film cleaning step of cleaning a front surface of the coating film.
Claims16
A substrate processing method comprising:
- a substrate holding step of horizontally holding a substrate having a first major surface, on which a metal pattern is formed, and a second major surface at an opposite side of the first major surface;
- a coating film forming step of supplying a coating agent to the first major surface to form a sublimating coating film, which covers the first major surface, such that a thickness of the coating film is greater than a height of the metal pattern;
- a coating film cleaning step of cleaning a front surface of the coating film;
- and
- a sublimating step of sublimating the coating film by heating the substrate after an end of the coating film cleaning step,
- wherein the coating film cleaning step is a step of removing a surface layer of the coating film, such that, even after removing the surface layer, the coating film remains on the first major surface with a thickness greater than the height of the metal pattern and the metal pattern is not exposed, and
- the sublimating step is a step of removing all the coating film which remains on the first major surface even after removal of the surface layer of the coating film.
4 more elements
The substrate processing method comprising:
- a substrate holding step of horizontally holding a substrate having a first major surface and a second major surface at an opposite side of the first major surface;
- a coating film forming step of supplying a coating agent to the first major surface to form a sublimating coating film which covers the first major surface;
- a coating film cleaning step of cleaning a front surface of the coating film;
- and
- a second major surface cleaning step of cleaning the second major surface after the end of the coating film forming step,
- wherein the coating film cleaning step is started after the end of the second major surface cleaning step or is executed in parallel with the second major surface cleaning step,
- the method further comprises a protective liquid supplying step of supplying a protective liquid, which protects the front surface of the coating film, to the front surface of the coating film, and
- the protective liquid supplying step is executed in parallel with the second major surface cleaning step before the start of the coating film cleaning step.
5 more elements
Dependencies are inferred from the claim text.