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US 10,651,006 B2Granted
Ion beam apparatus
AssigneeHitachi High-Tech Science Corporation
InventorsShinichi Matsubara, Yoshimi Kawanami, Hiroyasu Shichi
Life of this patent
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Abstract
According to an embodiment of the present invention, an ion beam apparatus switches between an operation mode of performing irradiation with an ion beam most including H3+ ions and an operation mode of performing irradiation with an ion beam most including ions heavier than the H3+.
Claims12
An ion beam apparatus, comprising:
- an emitter tip having a needle-like point;
- an extraction electrode having an opening which is disposed to be opposite to the emitter tip and is at a position separated from the emitter tip;
- a gas supply source supplying gas;
- a gas supply pipe supplying the gas supplied from the gas supply source to the vicinity of the emitter tip;
- a voltage applying portion performing irradiation with an ion beam from the emitter tip by applying a voltage between the emitter tip and the extraction electrode,
- wherein the voltage applying portion is configured for switching ion beam types by switching between an operation mode of applying a first voltage with which irradiation with the ion beam including mostly H3+ ions is performed and an operation mode of applying a second different voltage with which irradiation with the ion beam including mostly an ion heavier than H3+ is performed without performing an evacuation between the operation mode of applying the first voltage and the operation mode of applying the second voltage, and a stability of an H3+ ion current is kept constant;
- and
- wherein the gas supply source supplies, while supplying a first type of gas, a second type of gas different from the first type of gas;
- wherein the gas supply source includes a first gas cylinder supplying the first type of gas and a second gas cylinder supplying the second type of gas;
- a gas mixer storing the first type of gas, received from the first gas cylinder after passing through a first gas filter followed by a first flow rate adjustor, and the second type of gas, received from the second gas cylinder after passing through a second flow rate adjustor followed by a second gas filter, and disposed between the gas supply source and the gas supply pipe;
- and
- a mixing ratio controller controlling a gas mixing ratio in the gas mixer by adjusting a flow rate of the first type of gas and a flow rate of the second type of gas by controlling the first and second flow rate adjustors.
9 more elements
Dependencies are inferred from the claim text.