Charged particle beam device

A charged particle beam device that detects a secondary charged particle beam generated by irradiation of a sample by a primary charged particle beam, the charged particle beam device comprising:

• an image shift deflector that shifts an irradiation region for irradiation of the sample by the primary charged particle beam;
• a correction mechanism that is placed off of the trajectory of the primary charged particle beam but on the trajectory of the secondary charged particle beam, the correction mechanism deflecting the secondary charged particle beam passing through;
• and
• a controller that controls the correction mechanism according to a defined relationship between a shift amount by the image shift deflector and a correction amount by the correction mechanism,
• wherein, when setting the control information of the correction mechanism, the controller
• generates, as a reference image, an image of a secondary charged particle beam of a first pattern under a reference image shift amount,
• determines a correction amount for differing image shift amounts such that the difference between the image of the secondary charged particle beam of the first pattern under the differing image shift amounts and the reference image under the reference image shift amount is within a defined range for each of the differing image shift amounts, and
• stores a relationship between the differing image shift amounts and the determined correction amount as a preset relationship.

A control method for a charged particle beam device that detects a secondary charged particle beam generated by irradiation of a sample by a primary charged particle beam,

• wherein the charged particle beam device includes:
• an image shift deflector that shifts an irradiation region for irradiation of the sample by the primary charged particle beam;
• a magnetic sector that separates the primary charged particle beam passing therein from the secondary charged particle beam from the sample using a magnetic field generated therein;
• and
• a correction mechanism that is placed off of the trajectory of the primary charged particle beam but on the trajectory of the secondary charged particle beam inside the magnetic sector, the correction mechanism deflecting the secondary charged particle beam passing through, and
• wherein the control method comprises:
• controlling the correction mechanism according to a defined relationship between a shift amount by the image shift deflector and a correction amount by the correction mechanism.