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US 10,649,332 B2Granted
Resist composition and patterning process
AssigneeShin-Etsu Chemicla Co., Ltd.
InventorsJun Hatakeyama, Masaki Ohashi
Life of this patent
Estimating the term…
Abstract
A resist composition comprising a base polymer and a quencher in the form of an iodonium salt of fluorinated aminobenzoic acid, fluorinated nitrobenzoic acid or fluorinated hydroxybenzoic acid offers a high dissolution contrast and minimal LWR independent of whether it is of positive or negative tone.
Claims8
A negative resist composition comprising a base polymer and a quencher containing an iodonium salt having the formula (A):
- wherein R1 is a nitro group, hydroxyl group or a group having the formula (A-1) below, R2 is fluorine or trifluoromethyl, R3 is methyl or cyano, R4 is hydroxyl, halogen, trifluoromethyl, nitro, carboxyl, a C2-C10 acyl group, C2-C10 acyloxy group, C2-C10 alkoxycarbonyl group, a straight, branched or cyclic C1-C12 alkyl group which may contain oxo, a straight, branched or cyclic C2-C12 alkenyl group which may contain oxo, a straight, branched or cyclic C1-C12 alkoxy group, C6-C20 aryl group, or C7-C12 aralkyl or aryloxyalkyl group, R5 is an optionally substituted phenyl group having the formula (A-2) below or an optionally substituted ethynyl group having the formula (A-3) below, m is an integer of 1 to 4, n is an integer of 0 to 3, and p is an integer of 0 to 5,
- wherein R6 and R7 are each independently hydrogen or a straight, branched or cyclic C1-C6 alkyl group, R6 and R7 may bond together to form a ring with the nitrogen atom to which they are attached, which ring may contain an ether bond,
- R8 is hydroxyl, halogen, trifluoromethyl, nitro, carboxyl, a C2-C10 acyl group, C2-C10 acyloxy group, C2-C10 alkoxycarbonyl group, a straight, branched or cyclic C1-C12 alkyl group which may contain oxo, a straight, branched or cyclic C2-C12 alkenyl group which may contain oxo, a straight, branched or cyclic C1-C12 alkoxy group, C6-C20 aryl group, or C7-C12 aralkyl or aryloxyalkyl group,
- R9 is hydrogen, hydroxyl, halogen, trifluoromethyl, nitro, carboxyl, a C2-C10 acyl group, C2-C10 acyloxy group, C2-C10 alkoxycarbonyl group, a straight, branched or cyclic C1-C12 alkyl group which may contain oxo, a straight, branched or cyclic C2-C12 alkenyl group which may contain oxo, a straight, branched or cyclic C1-C12 alkoxy group, C6-C20 aryl group, or C7-C12 aralkyl or aryloxyalkyl group, and q is an integer of 0 to 5, and
- wherein the base polymer consists of a polymer which is free of an acid labile group.
2 more elements
Dependencies are inferred from the claim text.