Active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, pattern forming method, method for manufacturing electronic device, and electronic device

An active-light-sensitive or radiation-sensitive resin composition comprising

• a basic compound (A) that is represented by the following General Formula (I),
• an acid generator (B), and
• a resin (P) having a group that decomposes by the action of an acid to generate a polar group,
• W-L-RN (I)
• in General Formula (I),
• RN represents a basic site,
• L represents a single bond or a divalent linking group, and
• W represents a bridged alicyclic group having 7 to 15 carbon atoms, the bridged alicyclic group including a polar group, W represents a heterocyclic ring having 6 to 20 carbon atoms, or W represents a monovalent group formed by removing a hydrogen atom from the structure of anthraquinone.