Mold with cavities for nanoimprint lithography and method of imprinting same

A mold system with a cavity for nanoimprint lithography, wherein the mold is a one-piece structure, comprising an upper mold and a lower mold which are welded together;

• the upper mold is evenly provided with a plurality of stepped holes;
• a diameter of an upper portion of each of the plurality of stepped holes is greater than a diameter of a lower portion of each of the plurality of stepped holes;
• the stepped holes penetrate through the upper mold;
• a length-to-diameter ratio of the upper portion of each stepped hole is 3-30:1;
• the diameter of the upper portion of each stepped hole is 5-10 times the diameter of the lower portion of each stepped hole;
• the number of the stepped holes and a relative position between the plurality of stepped holes respectively correspond to the number of protrusions of an imprinted structure and a relative position between the protrusions of the imprinted structure;
• the upper portion of the stepped hole and the corresponding protrusion of the imprinted structure are equal in size;
• a plurality of grooves are provided at an upper surface of the lower mold;
• the grooves penetrate through the lower mold;
• a diameter of each groove is larger than the diameter of the lower portion of the stepped hole;
• the lower portion of the stepped hole communicates with the corresponding groove;
• two connecting tubes are respectively provided at both ends of each of the plurality of grooves by welding;
• one connecting tube is connected to an external high pressure pump via a first pipeline;
• and the other connecting tube is connected to an external vacuum pump via a second pipeline;
• and
• the first pipeline and the second pipeline each are provided with a pressure gage and a pressure regulating valve.