Duty cycle, depth, and surface energy control in nano fabrication

A method of fabricating a nanoimprint lithography (NIL) mold with a target surface-relief structure, the method comprising:

• manufacturing a preliminary surface-relief structure of the NIL mold, the preliminary surface-relief structure comprising a plurality of ridges, wherein a parameter of the preliminary surface-relief structure is different from a corresponding parameter of the target surface-relief structure;
• and
• modifying the parameter of the preliminary surface-relief structure to make the target surface-relief structure, wherein modifying the parameter of the preliminary surface-relief structure comprises:
• depositing a material layer on the preliminary surface-relief structure using a vapor deposition process;
• and
• etching or surface-treating the deposited material layer using a dry or wet isotropic etching process to make the target surface-relief structure, wherein the target surface-relief structure is different from the preliminary surface-relief structure in at least one of a height or a slant angle of a ridge in the plurality of ridges.