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US 10,648,999 B2Granted
Method for manufacturing an acceleration sensor
AssigneeInfineon Technologies AG
InventorDirk Meinhold
Life of this patent
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Abstract
Various acceleration sensors are disclosed. In some cases, an inertial mass may be formed during back-end-of-line (BEOL). In other cases, a membrane may have a bent, undulated or winded shape. In yet other embodiments, an inertial mass may span two or more pressure sensing structures.
Claims13
A method for manufacturing an acceleration sensor, the method comprising:
- forming a pressure sensing structure in a wafer;
- providing, during a front end of line (FEOL), elements on a surface of the wafer;
- forming, during a back end of line (BEOL), a BEOL inertial mass of metal layers and dielectric layers disposed over the surface of the wafer,
- where the BEOL inertial mass is formed during the BEOL on the pressure sensing structure;
- and
- forming, during the BEOL, a BEOL layer over the surface of the wafer such that the BEOL inertial mass and the BEOL layer are separated by the elements.
3 more elements
Dependencies are inferred from the claim text.