Rotation rate sensor with multiple evaluation during operation at several frequencies

A method for operating a rotation rate sensor, the method comprising:

• deflecting, using a drive signal of a drive device and at a first frequency, each of a first structure, a second structure, a third structure, and a fourth structure of the sensor essentially parallel to a drive direction such that the first and fourth structures are excited to an oscillation that is essentially in-phase relative to each other and essentially in phase-opposition relative to the second and third structures;
• and
• deflecting, using a drive signal of the drive device and at a second frequency, each of the first structure, the second structure, the third structure, and the fourth structure of the sensor essentially parallel to the drive direction such that the first and second structures are excited to an oscillation that is essentially in-phase relative to each other and essentially in phase-opposition relative to the third and fourth structures;
• wherein the first structure is coupled to a substrate, to the second structure, and to the third structure,
• wherein the second structure is coupled to the first structure, to the substrate, and to the fourth structure,
• wherein the third structure is coupled to the substrate, to the fourth structure, and to the first structure, and
• wherein the fourth structure is coupled to the third structure, to the substrate, and to the second structure;
• wherein the rotation rate sensor, includes:
• the substrate;
• the first structure that is movable relative to the substrate;
• the second structure that is movable relative to the substrate and to the first structure;
• the third structure that is movable relative to the substrate and to the first and second structures;
• the fourth structure that is movable relative to the substrate and to the first, second, and third structures;
• and
• the drive device to deflect each of the first, second, third, and fourth structures essentially parallel to a drive direction and out of respective resting positions of the first, second, third, and fourth structures, such that:
• at a first frequency, the first and fourth structures are excitable to an oscillation that is essentially in-phase relative to each other and essentially in phase-opposition relative to the second and third structures;
• and
• at a second frequency, the first and second structures are excitable to an oscillation that is essentially in-phase relative to each other and essentially in phase-opposition relative to the third and fourth structures;
• wherein the first structure is coupled to the substrate, to the second structure, and to the third structure, wherein the second structure is coupled to the first structure, to the substrate, and to the fourth structure, wherein the third structure is coupled to the substrate, to the fourth structure, and to the first structure, and wherein the fourth structure is coupled to the third structure, to the substrate, and to the second structure;
• a first detection unit to detect a first force action on the first structure along a direction which is essentially parallel to a first axis essentially perpendicular to a main extension plane of the substrate;
• a second detection unit to detect a second force action on the second structure along a direction which is essentially parallel to the first axis;
• a third detection unit to detect a third force action on the third structure along a direction which is essentially parallel to the first axis;
• and
• a fourth detection unit to detect a fourth force action on the fourth structure along a direction which is essentially parallel to the first axis, wherein the first, second, third, and fourth force actions are effectuated by a rotation rate of the rotation rate sensor about an axis that is essentially parallel to a second axis essentially parallel to the main extension plane;
• a further first detection unit having two further first electrodes for detecting a further first force action on the first structure along a direction which is essentially parallel to the second axis;
• a further second detection unit having two further second electrodes for detecting a further second force action on the second structure along a direction which is essentially parallel to the second axis;
• a further third detection unit having two further third electrodes for detecting a further third force action on the third structure along a direction which is essentially parallel to the second axis;
• and
• a further fourth detection unit having two further fourth electrodes for detecting a further fourth force action on the fourth structure along a direction which is essentially parallel to the second axis in each case;
• wherein the further first force action, the further second force action, the further third force action, and the further fourth force action are effectuated as a result of a rotation rate of the rotation rate sensor about an axis which is essentially parallel to the first axis.