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US 10,648,793 B2Granted
Library expansion system, method, and computer program product for metrology
AssigneeKLA-Tencor Corporation
InventorsLeonid Poslavsky, Liequan Lee
Life of this patent
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Abstract
A library expansion system, method, and computer program product for metrology are provided. In use, processing within a first multi-dimensional library is performed by a metrology system. During the processing within the first multi-dimensional library, a second multi-dimensional library is identified. The processing is then transitioned to the second multi-dimensional library. Further, processing within the second multi-dimensional library is performed by the metrology system.
Claims13
A method, comprising:
- storing, in memory of a metrology system:
- a first multi-dimensional library that represents a first portion of a parametric model of a fabricated device, the first multi-dimensional library having a first set of values for each parameter of a plurality of parameters of the fabricated device where each first set of values is of a first range,
- a second multi-dimensional library having a second set of values for a first one of the parameters of the fabricated device, the second set of values being of a second range that is within the first range and the second set of values having a higher accuracy than the first set of values, and
- a third multi-dimensional library having a third set of values for a second one of the parameters of the fabricated device, the third set of values being of a third range that is within the first range and the third set of values having a higher accuracy than the first set of values;
- illuminating, by a light source of the metrology system, the fabricated device;
- receiving, by a detector of the metrology system, light reflected from the fabricated device as a result of the illuminating;
- generating, by the detector of the metrology system, output responsive to the received light, the output including a plurality of parameter values measured for the parameters of the fabricated device;
- and
- providing, by the detector of the metrology system, the output to a computer system of the metrology system for processing thereof including a spectra evaluation of the output to measure critical dimensions of the fabricated device;
- in response to the computer system receiving the output from the detector, identifying, by the computer system of the metrology system, the first multi-dimensional library;
- performing, by the computer system of the metrology system, the processing of a first parameter value of the plurality of parameter values that is within the first multi-dimensional library to produce a spectra for the first parameter value using the first multi-dimensional library;
- during the processing within the first multi-dimensional library, identifying, by the computer system of the metrology system, a second parameter value of the plurality of parameter values that is within the second multi-dimensional library;
- transitioning, by the computer system of the metrology system, the processing to the second multi-dimensional library;
- performing, by the computer system of the metrology system, the processing of the second parameter value within the second multi-dimensional library to produce a spectra for the second parameter value using the second multi-dimensional library;
- during the processing within the second multi-dimensional library, identifying, by the computer system of the metrology system, a third parameter value of the plurality of parameter values that is within the third multi-dimensional library;
- transitioning, by the computer system of the metrology system, the processing to the third multi-dimensional library;
- and
- performing, by the computer system of the metrology system, the processing of the third parameter value within the third multi-dimensional library to produce a spectra for the third parameter value using the third multi-dimensional library.
15 more elements
A non-transitory computer readable medium storing a computer program product including computer code adapted to be executed by a processor of a metrology system to cause the processor to perform a method, comprising:
- storing, in memory of a metrology system:
- a first multi-dimensional library that represents a first portion of a parametric model of a fabricated device, the first multi-dimensional library having a first set of values for each parameter of a plurality of parameters of the fabricated device where each first set of values is of a first range,
- a second multi-dimensional library having a second set of values for a first one of the parameters of the fabricated device, the second set of values being of a second range that is within the first range and the second set of values having a higher accuracy than the first set of values, and
- a third multi-dimensional library having a third set of values for a second one of the parameters of the fabricated device, the third set of values being of a third range that is within the first range and the third set of values having a higher accuracy than the first set of values;
- causing a light source of a metrology system to illuminate the fabricated device such that a detector of the metrology system receives light reflected from the fabricated device as a result of the illuminating;
- generating, by the detector of the metrology system, output responsive to the received light, the output including a plurality of parameter values measured for the parameters of the fabricated device;
- and
- providing, by the detector of the metrology system, the output to the processor of the metrology system for processing thereof including a spectra evaluation of the output to measure critical dimensions of the fabricated device;
- in response to the processor receiving the output from the detector, identifying, by the processor of the metrology system, the first multi-dimensional library;
- performing, by the processor of the metrology system, the processing of a first parameter value of the plurality of parameter values that is within the first multi-dimensional library to produce a spectra for the first parameter value using the first multi-dimensional library;
- during the processing within the first multi-dimensional library, identifying, by the processor of the metrology system, a second parameter value of the plurality of parameter values that is within the second multi-dimensional library;
- transitioning, by the processor of the metrology system, the processing to the second multi-dimensional library;
- performing, by the processor of the metrology system, the processing of the second parameter value within the second multi-dimensional library to produce a spectra for the second parameter value using the second multi-dimensional library;
- during the processing within the second multi-dimensional library, identifying, by the processor of the metrology system, a third parameter value of the plurality of parameter values that is within the third multi-dimensional library;
- transitioning, by the processor of the metrology system, the processing to the third multi-dimensional library;
- and
- performing, by the processor of the metrology system, the processing of the third parameter value within the third multi-dimensional library to produce a spectra for the third parameter value using the third multi-dimensional library.
14 more elements
A metrology system, comprising:
- memory storing:
- a first multi-dimensional library that represents a first portion of a parametric model of a fabricated device, the first multi-dimensional library having a first set of values for each parameter of a plurality of parameters of the fabricated device where each first set of values is of a first range,
- a second multi-dimensional library having a second set of values for a first one of the parameters of the fabricated device, the second set of values being of a second range that is within the first range and the second set of values having a higher accuracy than the first set of values, and
- a third multi-dimensional library having a third set of values for a second one of the parameters of the fabricated device, the third set of values being of a third range that is within the first range and the third set of values having a higher accuracy than the first set of values;
- a light source for illuminating the fabricated device;
- a detector for:
- receiving light reflected from the fabricated device as a result of the illuminating,
- generating output responsive to the received light, the output including a plurality of parameter values measured for the parameters of the fabricated device, and
- providing the output to a computer system of the metrology system for processing thereof including a spectra evaluation of the output to measure critical dimensions of the fabricated device;
- and
- the computer system for:
- in response to the computer system receiving the output from the detector, identifying the first multi-dimensional library;
- performing the processing of a first parameter value of the plurality of parameter values that is within the first multi-dimensional library to produce a spectra for the first parameter value using the first multi-dimensional library;
- during the processing within the first multi-dimensional library, identifying a second parameter value of the plurality of parameter values that is within the second multi-dimensional library;
- transitioning the processing to the second multi-dimensional library;
- performing the processing of the second parameter value within the second multi-dimensional library to produce a spectra for the second parameter value using the second multi-dimensional library;
- during the processing within the second multi-dimensional library, identifying a third parameter value of the plurality of parameter values that is within the third multi-dimensional library;
- transitioning the processing to the third multi-dimensional library;
- and
- performing the processing of the third parameter value within the third multi-dimensional library to produce a spectra for the third parameter value using the third multi-dimensional library.
17 more elements
Dependencies are inferred from the claim text.