Chemical-mechanical polishing composition comprising benzotriazole derivatives as corrosion inhibitors

A chemical-mechanical polishing (CMP) composition in the form of a ready to use slurry comprising:

• (A) one or more compounds of formula (1):
• wherein the pairs of dashed lines in formula (1) either each represent a double bond or each represent a single bond, wherein
• (i) when each pair of dashed lines in formula (1) represents a double bond then one of R1 and R2 is hydrogen and the other of R1 and R2 is selected from the group consisting of chlorine, bromine, alkyl with three to six carbon atoms, benzoyl and —COOR3, wherein R3 is selected from the group consisting of alkyls with three to six carbon atoms or R3 is a substituent comprising a structural unit selected from the group consisting of —(CH2—CH2—O)n—H and —(CH2—CH2—O)—CH3, wherein n in each case is an integer in the range of from 1 to 15, or R1 and R2 are both independently selected from the group consisting of bromine and chlorine, and
• (ii) when each pair of dashed lines in formula (1) represents a single bond then R1 and R2 are hydrogen, or one of R1 and R2 is hydrogen and the other of R1 and R2 is selected from the group consisting of chlorine, bromine, alkyl with three to six carbon atoms, benzoyl and —COOR3 wherein R3 is selected from the group consisting of alkyls with three to six carbon atoms or R3 is a substituent comprising a structural unit selected from the group consisting of —(CH2—CH2—O)n—H and —(CH2—CH2-O)n—CH3, wherein n in each case is an integer in the range of from 1 to 15, or R1 and R2 are both independently selected from the group consisting of bromine and chlorine;
• and
• (B) between 0.002 wt % to 7 wt % of inorganic particles, organic particles, or a composite or mixture thereof, having an average sphericity ranging from 0.4 to 0.9 nm, an average primary particle size of 35 nm, and an average secondary particle size of 70 nm;
• wherein the total amount of cations selected from the group consisting of magnesium and calcium is less than 1 ppm based on the total weight of the respective CMP composition;
• wherein the total amount of said one or more compounds of formula (1) is in a range of from 0.0001% to 1 wt. % based on the total weight of the respective CMP composition, and the particles (B) are cocoon shaped;
• and
• wherein the pH of the CMP composition ranges from 9.5 to 14.