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US 10,625,392 B2Granted
Polishing pad
AssigneeNitta Haas Incorporated
InventorsYohei Murakami, Nobuyuki Oshima, Hiroyuki Nakano
Life of this patent
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Abstract
The present invention is a polishing pad formed by foamed polyurethane, with a content of S phase in the foamed polyurethane, as determined by pulsed NMR measurement at 25° C., exceeding 70%.
Claims2
A polishing pad formed by foamed polyurethane, with a content of S phase in the foamed polyurethane, as determined by pulsed NMR measurement at 25° C., exceeding 70%.
Dependencies are inferred from the claim text.