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US 10,605,824 B2Granted
MEMS manufacturing method and MEMS manufacturing apparatus
AssigneeHitachi, Ltd.
InventorsShuntaro Machida, Nobuyuki Sugii, Keiji Watanabe, Daisuke Ryuzaki, Tetsufumi Kawamura, Kazuki Watanabe
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Abstract
For the purpose of shortening the MEMS manufacturing TAT, the MEMS manufacturing method according to the present invention includes a step of extracting the first MEMS with first characteristic in a range approximate to the required characteristic from the plurality of MEMS preliminarily prepared on the main surface of the substrate, and a step of forming a second MEMS having the required characteristic by directly processing the first MEMS.
Claims12
A MEMS manufacturing method comprising:
- (a) a step of preparing a correlation diagram between a parameter of the MEMS and a device characteristic;
- (b) a step of preliminarily forming a plurality of MEMS each having a parameter and a device characteristic corresponding to the correlation diagram, on a main surface of a substrate;
- (c) a step of selecting a first characteristic in a region approximate to a required characteristic from the correlation diagram;
- (d) a step of selecting a first MEMS having the first characteristic on the basis of the correlation diagram from the plurality of MEMS preliminarily prepared on the main surface of the substrate;
- and
- (e) a step of forming a second MEMS having the required characteristic by directly processing the first MEMS.
3 more elements
A MEMS manufacturing method comprising the steps of:
- (a) preparing a correlation diagram between a parameter and a device characteristic of the MEMS;
- (b) preliminarily preparing a plurality of members each having the parameter corresponding to the correlation diagram;
- (c) selecting a first characteristic in a range approximate to a required characteristic, from the correlation diagram;
- (d) selecting a plurality of components on the basis of the correlation diagram from the plurality of members preliminarily prepared;
- (e) forming a first MEMS with a first characteristic in a range approximate to a required characteristic by assembling the plurality of components on a main surface of a substrate;
- and
- (f) forming a second MEMS with the required characteristic by directly processing the first MEMS.
4 more elements
Dependencies are inferred from the claim text.