Method for manufacturing aluminum plate, aluminum plate, collector for storage device, and storage device

An aluminum plate having an aluminum substrate having a plurality of through holes in a thickness direction,

• wherein an average opening diameter of the through holes is in a range of 0.1 μm to 100 μm, and a proportion of through holes having an opening diameter of 5 μm or smaller in the through holes is more than 3% and 50% or lower, and
• the aluminum plate further comprising unpenetrated recessed portions having an average opening diameter in a range of 0.1 μm to 100 μm,
• wherein an occupancy of the recessed portions is 10% or greater,
• a specific surface area ΔS of the surface is 5% or larger, and
• wherein an etching duration necessary for an amount of oxygen atoms, which is measured by means of Electron Spectroscopy for Chemical Analysis after Ar ion etching is carried out on a surface of the aluminum plate, to reach 0% is 12 minutes or shorter;
• here, the specific surface area ΔS refers to a value obtained from Expression (i) below using an actual area S, that is obtained from three-dimensional data, which is obtained by measuring specific surface areas using an atomic force microscope at 512×128 points in a 25 μm×25 μm range on the surface, using a three-point approximation method and a geometric measurement area S0:
• ΔS=(Sx−S0)/S0×100(%) (i).