Electrostatic doping-based all GNR tunnel field-effect transistor
AssigneeCemalettin Basaran
InventorsCemalettin Basaran, Weixiang Zhang, Tarek Ragab
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Abstract
The present invention disclose an Electrostatic doping (ED)-based graphene nanoribbon (GNR) tunneling field-effect transistor (TFET) with tri-gate design. This device uses hydrogen-passivated GNR heterojunction as a carrier path way and functions as a power switch providing a switching speed of ˜0.3 ps−1 an ION/IOFF ratio as high as 1014 with the on-state current in the order of 103 μA/μm. This disclosed invention consists of two electrode, two electrode extensions, six metallic gate regions, and six dielectric regions.
Claims1
An energy-efficient transistor model for power switch application comprising the following:
- a carrier path made of hydrogen-passivated armchair Graphene Nano-ribbon (GNR) heterojunction, which can be divided into three sections:
- a channel made of 3p dimmer armchair GNR (p is integer number greater than 3), a source and a drain made of same type 3p+2 dimmer armchair GNR, the value of p takes same value for channel, source and drain,
- two electrodes, made of the same material with the source and drain, connected to source and drain at the two ends, respectively,
- two doping gate at left/right sides of the device, sandwiching the source and drain part of the GNR path,
- one control gate in the middle of the device, sandwiching the channel part of the GNR path,
- the gates are made of two layers:
- copper in the top layer and diamond in the bottom layer,
- the doping gates at source and drain are applied with opposite voltages and the control gate is applied with a voltage range between −1.5V to +1.5V, where the device is functioning, the transistor can function as a power switch with a large on/off current ratio of 10{circumflex over ( )}15.
Dependencies are inferred from the claim text.