Display device and method of manufacturing the same

A method for manufacturing a display device, the method comprising:

• forming a lower gate metal pattern including a first gate electrode;
• forming a first insulation layer on the lower gate metal pattern;
• forming a semiconductor pattern on the first insulation layer, the semiconductor pattern including a first active area and a second active area spaced apart from the first active area, the first active area overlapping the first gate electrode;
• forming a second insulation layer on the semiconductor pattern;
• forming a PMOS area by doping the first active area;
• forming an NMOS area by doping the second active area;
• forming an upper gate metal pattern on the second insulation layer, the upper gate metal pattern including a second gate electrode that overlaps the NMOS area and an active-protecting pattern that contacts the PMOS area so that a portion of the active-protecting pattern is disposed on the upper surface of the second insulation layer, the active-protecting pattern being formed of a same material as the second gate electrode;
• forming a third insulation layer on the second gate electrode and the active-protecting pattern;
• and
• forming a data metal pattern including a data metal electrode passing through the third insulation layer to contact the active-protecting pattern.