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US 10,593,752 B2Granted
Isolated well contact in semiconductor devices
AssigneeTexas Instruments Incorporated
InventorsBruce Lynn Pickelsimer, Patrick Robert Smith, Terry James Bordelon, Jr.
Life of this patent
Estimating the term…
Abstract
An integrated circuit and method has an isolated well with an improved isolated well contact. The well contact diffusion is isolated from a device diffusion of opposite conductivity type within the isolated well by an isolation transistor gate.
Claims18
An integrated circuit, comprising:
- a substrate of a first conductivity type;
- an isolation well within the substrate, the isolation well being of a second conductivity type opposite the first conductivity type;
- a first transistor device within the isolation well, the first transistor containing drain and source diffusions of the first conductivity type;
- an isolation well contact diffusion within the isolation well, the well contact diffusion being of the second conductivity type;
- an isolation transistor gate over the isolation well between the first transistor device drain and source diffusions and the isolation well contact diffusion to isolate the isolation well contact diffusion from the first transistor device drain and source diffusion;
- a substrate contact diffusion in the substrate;
- and
- a shallow trench isolation (STI) geometry formed in the substrate between the substrate contact diffusion and the isolation well to electrically isolate the isolation well from the substrate.
5 more elements
An integrated circuit comprising:
- an isolation well of a second conductivity type in a substrate of a first conductivity type;
- an isolation structure over the isolation well, the isolation structure including an isolation transistor gate;
- a first transistor having a gate over the isolation well separate from the isolation structure;
- dielectric sidewall spacers on the isolation transistor gate and on the gate of the first transistor;
- source and drain diffusions of the first conductivity type in the isolation well self-aligned to the dielectric sidewall spacers on the gate of the first transistor, one of the source and drain diffusions is self-aligned to a dielectric sidewall spacer on a first side of the isolation structure;
- a well contact diffusion of the second conductivity type in the isolation well adjacent a second side of the isolation structure;
- a substrate contact diffusion in the substrate;
- and
- a shallow trench isolation (STI) geometry formed in the substrate between the substrate contact diffusion and the isolation well to electrically isolate the isolation well from the substrate.
6 more elements
An integrated circuit comprising:
- an isolation well with a second conductivity type in a substrate with a first conductivity type;
- an isolation well contact region within the isolation well;
- an isolation transistor gate adjacent to the isolation well contact region;
- dielectric sidewall spacers on sidewalls of the isolation transistor gate;
- a first transistor device diffusion of the first conductivity type in the isolation well region adjacent to a first side of the isolation transistor gate;
- a wall contact diffusion of the second conductivity type in the isolation well contact region adjacent to a second side of the isolation transistor gate;
- a substrate contact diffusion in the substrate;
- and
- a shallow trench isolation (STI) geometry formed in the substrate between the substrate contact diffusion and the isolation well to electrically isolate the isolation well from the substrate.
6 more elements
Dependencies are inferred from the claim text.