Deep high capacity capacitor for bulk substrates
AssigneeInternational Business Machines Corporation
InventorsPraneet Adusumilli, Keith E. Fogel, Alexander Reznicek, Oscar van der Straten
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Abstract
A deep trench capacitor having a high capacity is formed into a deep trench having faceted sidewall surfaces. The deep trench is located in a bulk silicon substrate that contains an upper region of undoped silicon and a lower region of n-doped silicon. The lower region of the bulk silicon substrate includes alternating regions of n-doped silicon that have a first boron concentration (i.e., boron deficient regions), and regions of n-doped silicon that have a second boron concentration which is greater than the first boron concentration (i.e., boron rich regions).
Claims10
A semiconductor structure comprising:
- a deep trench capacitor present in a deep trench having faceted sidewall surfaces that is located in a bulk silicon substrate, wherein the bulk silicon substrate includes an upper region of undoped silicon and a lower region of n-doped silicon, wherein the lower region comprises alternating regions of n-doped silicon that have a first boron concentration, and regions of n-doped silicon that have a second boron concentration which is greater than the first boron concentration.
A semiconductor structure comprising:
- a first deep trench capacitor present in a first deep trench having faceted sidewall surfaces that is located in a bulk silicon substrate, wherein the bulk silicon substrate includes an upper region of undoped silicon and a lower region of n-doped silicon, wherein the lower region comprises alternating regions of n-doped silicon that have a first boron concentration, and regions of n-doped silicon that have a second boron concentration which is greater than the first boron concentration;
- and
- a second deep trench capacitor present in a second deep trench having faceted sidewall surfaces that is located in the bulk silicon substrate, wherein a flowable dielectric material is located in a lower portion of the second deep trench and located entirely beneath the second deep trench capacitor.
Dependencies are inferred from the claim text.