Substrate processing apparatus

A substrate processing apparatus comprising:

• a liquid processing chamber configured to perform a liquid processing on a substrate using a processing liquid;
• a drying processing chamber provided at a side of the liquid processing chamber and configured to perform a drying processing on the substrate in a wet state after the liquid processing in the liquid processing chamber;
• a placing table provided at a diagonal position of the liquid processing chamber;
• a first conveyance arm including a first holder and provided in front of the liquid processing chamber and at a side of the placing table to face both the liquid processing chamber and the placing table when viewed from above, the first conveyance arm being configured to convey the substrate before the liquid processing to the liquid processing chamber from the placing table using the first holder thereof;
• and
• a second conveyance arm including a second holder and provided between the first conveyance arm and the drying processing chamber to face the drying processing chamber and the liquid processing chamber, respectively, the second conveyance arm being configured to convey the substrate in the wet state from the liquid processing chamber to the drying processing chamber using the second holder thereof,
• wherein the substrate before the liquid processing is conveyed in a dry state to the placing table by a third holder of a conveyance table, which is movable on a rail extended along a side of each of the placing table, the first conveyance arm, the second conveyance arm and the drying processing chamber, and the substrate after the drying processing is removed in a dry state from the drying processing chamber by a fourth holder of the conveyance table, and
• the first conveyance arm and the second conveyance arm are provided between the liquid processing chamber and the rail, and a cover is provided at a carry-out port from the drying processing chamber.