A circuit board having a substrate etched or ion implantated using, as a mask, a photocurable composition cured on the substrate by irradiating the photocurable composition with light while the photocurable composition is in contact with a mold to receive a pattern from the mold, wherein the photocurable composition is prepared by a process comprising:
- presenting a photocurable composition having:
- a polymerizable compound (A) having a parameter OA =NA/(NC,A−NO,A), where OA represents the Ohnishi parameter OA of the polymerizable compound (A), NA represents the total number of atoms in the molecule of the polymerizable compound (A), NC,A represents the number of carbon atoms in the molecule of the polymerizable compound (A), and NO,A represents the number of oxygen atoms in the molecule of the polymerizable compound (A), and
- a non-polymerizable component (E) containing at least one non-polymerizable compound (X) including a photopolymerization initiator (B), in a proportion in the range of more than 10% to 50% by weight relative to the total weight of the polymerizable compound (A) and the non-polymerizable component (E), wherein the non-polymerizable component (E) has a weight average molecular weight of 250 or less, and the at least one non-polymerizable compound (X) has a parameter OX=NX/(NC,X−NO,X), where OX represents the Ohnishi parameters OX of compounds (X) contained in the non-polymerizable component (E), NX represents the total number of atoms in the molecule of the corresponding compound (X), NC,X represents the number of carbon atoms in the molecule of the corresponding compound (X), and NO,X represents the number of oxygen atoms in the molecule of the corresponding compound (X),
- wherein the photocurable composition satisfies the following relational expressions (1) and (2):
- OA−OE>1.00 (1), and
- OAE<3.40 (2),
- wherein OE represents the molar fraction weighted average of the parameters OX of the at least one non-polymerizable compound (X), and OAE represents the molar fraction weighted average of the parameters OA and OE.