Temperature adjusting apparatus and method for a focus ring

A temperature adjusting apparatus for a focus ring, the apparatus being provided in a plasma processing apparatus;

• the plasma processing apparatus comprising:
• a vacuum reaction chamber (10) wherein plasma is formed in the reaction chamber (10) to process a substrate (40);
• a base (30) for holding the substrate (40) is disposed at a bottom within the reaction chamber (10);
• a focus ring (50) is provided surrounding an outer edge of the substrate (40);
• an insulating ring (60) is provided beneath the focus ring (50), the insulating ring (60) is located on a step at the periphery of the base (60);
• wherein, the temperature adjusting apparatus comprises a heater (73), the heater being cladded within a grounded shielding ring (70);
• the shielding ring (70) surrounds an outer edge of the step at the edge of the base (30) and an outer edge of the insulating ring (60);
• a heat conducting pad (93) is provided at a portion where the shielding ring (70) and the insulating ring (60) contact with each other, such that heat from the heater is transferred to the focus ring (50) through the shielding ring (70), the heat conducting pad (93), and the insulating ring (60), so as to adjust the temperature of the focus ring (50);
• and wherein the temperature adjusting apparatus further comprises:
• a first heat conducting pad (91) provided at a portion where the focus ring (50) and the insulating ring (60) contact with each other, heat from the heater being transferred to the focus ring (50) through the shielding ring (70), the heat conducting pad (93), the insulating ring (60), and the first heat conducting pad (91), so as to adjust the temperature of the focus ring (50).