Charged particle beam irradiation apparatus and device manufacturing method
AssigneeNikon Corporation
InventorYuichi Shibazaki
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Abstract
An electron beam irradiation apparatus which exposes a wafer coated with an electron beam resist with an electron beam is equipped with: a stage that can be moved holding the wafer; an electron beam optical system that irradiates the wafer with an electron beam; and, an opening member, placed facing the wafer via a predetermined gap on the wafer side in the optical arrangement direction of the electron beam optical system, and having an opening through which the electron beam from the electron beam optical system passes.
Claims42
A charged particle beam irradiation apparatus to irradiate a target with a charged particle beam, the irradiation apparatus comprising:
- a stage configured to hold the target;
- a charged particle beam optical system configured to irradiate the target with the charged particle beam;
- a charged particle detection device, which is disposed at an emitting side of the charged particle beam of the charged particle beam optical system;
- and
- a reflection member disposed between the stage and a final lens of the charged particle beam optical system, the reflection member being separate from the stage and the target, wherein
- the charged particle detection device is configured to detect charged particles reflected from the reflection member, and
- the target and the charged particle beam and relatively moved so that the target is irradiated with the charged particle beam.
A charged particle beam irradiation apparatus to irradiate a target with a charged particle beam, the irradiation apparatus comprising:
- a stage configured to hold the target;
- a charged particle beam optical system configured to irradiate the target with the charged particle beam;
- an opening member, which is arranged at an emitting side of the charged particle beam of the charged particle beam optical system, having an opening through which the charged particle beam passes;
- a charged particle detection device, which is disposed at an emitting side of the charged particle beam of the charged particle beam optical system;
- and
- a reflection member disposed between the stage and a final lens of the charged particle beam optical system, the reflection member being separate from the stage and the target, wherein
- the charged particle detection device is configured to detect charged particles reflected from the reflection member, and
- the target and the charged particle beam are relatively moved so that the target is irradiated with the charged particle beam.
Dependencies are inferred from the claim text.