Lithographic apparatus and method

A substrate table for a lithographic apparatus, the substrate table comprising:

• a substrate supporting area;
• either a sensor configured to detect radiation diffracted and/or reflected by a grating so as to measure a relative position between the grating and the sensor or the grating, wherein the grating or sensor is outward of the substrate supporting area;
• a structure having at least a portion thereof located between the substrate supporting area and the grating or sensor, the structure having an upper surface arranged to be essentially co-planar with an upper surface of the substrate, when supported on the substrate supporting area, and essentially co-planar with an upper surface of the sensor or grating, wherein the structure is spaced apart from the substrate, when supported on the substrate table, in a horizontal direction by the gap and spaced apart in the horizontal direction from the sensor or grating by a further gap;
• a plurality of heaters, each heater configured to control a temperature of a different region of or at the substrate supporting area and each being individually controllable;
• a plurality of temperature sensors, each temperature sensor configured to measure a temperature of a part of the substrate table;
• and
• an inlet to remove a fluid comprising liquid entering into a gap between the substrate and the substrate table.

A substrate table for a lithographic apparatus, the substrate table comprising:

• a substrate supporting area;
• either a sensor configured to detect radiation diffracted and/or reflected by a grating so as to measure a relative position between the grating and the sensor or the grating, wherein the grating or sensor is horizontally outward of the substrate supporting area;
• a structure having at least a portion thereof located horizontally outward from the substrate supporting area and horizontally inward of the grating or sensor, the structure forming a horizontal gap with a substrate, when the substrate is supported on the substrate supporting area, wherein the structure is spaced apart from the substrate, when supported on the substrate table, in a horizontal direction by the gap and spaced apart in the horizontal direction from the sensor or grating by a further gap;
• a plurality of heaters, each heater configured to control a temperature of a different region of or at the substrate supporting area and each being individually controllable;
• a plurality of temperature sensors, each temperature sensor configured to measure a temperature of a part of the substrate table;
• and
• an inlet adjacent to the gap, the inlet configured to remove a fluid comprising liquid.