Substrate processing apparatus, processing apparatus, and method for manufacturing device
AssigneeNikon Corporation
InventorsMasaki Kato, Tohru Kiuchi
Life of this patent
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AssigneeNikon Corporation
InventorsMasaki Kato, Tohru Kiuchi
Estimating the term…
A pattern exposure apparatus comprising: a rotary drum that supports a flexible substrate, which is exposed with a mask pattern formed on an outer circumferential surface of a cylindrical mask that rotates about a first center axis; a rotary drum-side scale portion that is arranged for measuring a movement of the substrate which is fed in a circumferential direction by a rotation of the rotary drum, that includes a scale; a first projection optical system that projects an exposure light; a second projection optical system that projects an exposure light; a first reading device that is arranged to oppose with the rotary drum-side scale portion and that reads the scale; and a second reading device that is arranged to oppose with the rotary drum-side scale portion and that reads the scale.
A pattern exposure apparatus that exposes a mask pattern to a substrate, the pattern exposure apparatus comprising:
Dependencies are inferred from the claim text.