Substrate processing apparatus and substrate processing method

A substrate processing method comprising:

• forming a metal-containing photosensitive film including a metallic component and a photosensitive material on a surface to be processed of a substrate by a film formation unit;
• irradiating a peripheral portion of the substrate after formation of the metal-containing photosensitive film with light by an edge exposer;
• performing development processing on a part of the metal-containing photosensitive film that has been irradiated with light by the edge exposer by supplying a development liquid to the peripheral portion of the substrate by an edge development processor;
• transporting the substrate after the development processing by the edge development processor to an exposure device;
• and
• performing development processing on the metal-containing photosensitive film by supplying a development liquid to the substrate in a development processing unit after exposure processing in the exposure device,
• wherein the performing of the development processing on the part of the metal-containing photosensitive film that has been irradiated with light by the edge exposer includes performing the development processing on the part of the metal-containing photosensitive film that has been irradiated with light by the edge exposer after the irradiation of the peripheral portion of the substrate with light by the edge exposer and before the exposure processing in the exposer.