US 10,591,620 B2Granted

Particle detector made of a semiconductor material

AssigneesUniversite D'Aix-Marseille, Centre National de la Recherche Scientifique (CNRS)

InventorsWilfried Vivian Roland Vervisch, Laurent Ottaviani, Stéphane Biondo, Vanessa Laurence Jill Hurtado Ep Vervisch

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Abstract

A system for measuring a particle beam includes a central and peripheral part and a front and back panel. The central part includes a system for producing a space charge zone to be passed through by a beam to be measured, charge carriers of a first and second type being generated by the beam when the latter passes through the space charge zone. The peripheral part includes a system for collecting at least one type of charge carrier from among the first or second type. The peripheral part surrounds the central part such that a particle beam can pass through the central part without passing through the peripheral part, an orifice being provided in back panel, in a region of the central part such that the thickness of the region, along a normal axis to the front panel is less than that of the peripheral part along the normal axis.

Claims14

Dependent claims

A device for measuring a particle beam comprising a first central part, a second peripheral part, a front face and a rear face, the front face being parallel to the rear face, wherein:

the central part comprises means for forming a space charge zone intended to be traversed by a particle beam to be measured, charge carriers of a first type and of a second type being generated by said particle beam when the particle beam traverses the space charge zone;
the peripheral part comprises means for collecting at least one type of charge carrier among the first type or the second type of charge carriers generated at the level of the space charge zone;
the peripheral part surrounding the central part such that a particle beam can traverse the central part without traversing the peripheral part, an orifice being arranged at a level of the rear face, in a region of the central part such that a thickness of said region of the central part along an axis normal to the front face is less than a thickness of the peripheral part along said normal axis.

Dependencies are inferred from the claim text.