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US 10,591,427 B2Granted
Analysis system and analysis method
AssigneeHamamatsu Photonics K.K.
InventorsTomonori Nakamura, Nobuyuki Hirai
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AssigneeHamamatsu Photonics K.K.
InventorsTomonori Nakamura, Nobuyuki Hirai
Estimating the term…
A heat source position inside a measurement object is identified with high accuracy by improving time resolution. An analysis system according to the present invention is an analysis system that identifies a heat source position inside a measurement object, and includes a condition setting unit that sets a measurement point for one surface of the measurement object, a tester that applies a stimulation signal to the measurement object, a light source that irradiates the measurement point of the measurement object with light, a photo detector that detects light reflected from a predetermined measurement point on the surface of the measurement object according to the irradiation of light and outputs a detection signal, and an analysis unit that derives a distance from the measurement point to the heat source position based on the detection signal and the stimulation signal and identifies the heat source position.
An analysis system for identifying a heat source position in a measurement object, the analysis system comprising:
An analysis method for identifying a heat source position in a measurement object, the analysis method comprising:
Dependencies are inferred from the claim text.