Photosensitive polyimide resin composition and method of manufacturing cover film using the same
AssigneeMicrocosm Technology Co., Ltd.
InventorsTang-Chieh Huang, Kunhan Hsieh
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AssigneeMicrocosm Technology Co., Ltd.
InventorsTang-Chieh Huang, Kunhan Hsieh
Estimating the term…
A photosensitive polyimide resin composition is provided. The resin composition comprises an infrared absorber, an epoxy, a photosensitive polyimide and a photo initiator. The infrared absorber includes pigment and has an amount of weight accounting for 5-40% of total solid weight of the photosensitive polyimide resin composition. The epoxy has an amount of weight accounting for 5-40% of total solid weight of the photosensitive polyimide resin composition. The photosensitive polyimide has the structure of formula (1): wherein m, n are independently 1 to 600; X is a tetravalent organic group, and the main chain of X includes alicyclic structure; Y is a divalent organic group, and the main chain of Y includes siloxane structure; Z is a divalent organic group, and the side chain of Z includes phenolic hydroxyl group or carboxyl group. The photosensitive polyimide has an amount of weight accounting for 30-90% of total solid weight of the photosensitive polyimide resin composition. The photo initiator has an amount of weight accounting for 0.1-15% of total solid weight of the transparent photosensitive resin.
A method for manufacturing a cover film comprising coating a photosensitive polyimide resin composition on a substrate and drying the photosensitive polyimide resin to obtain the cover film, wherein the photosensitive polyimide resin composition comprises:
Dependencies are inferred from the claim text.