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US 10,584,039 B2Granted
Titanium-containing film forming compositions for vapor deposition of titanium-containing films
AssigneeL'Air Liquide, Societe Anonyme pour l'Etude et l'Exploitation des Procedes Georges Claude
InventorsAntonio Sanchez, Jean-Marc Girard, Grigory Nikiforov, Nicolas Blasco
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Abstract
Titanium-containing film forming compositions comprising titanium halide-containing precursors are disclosed. Also disclosed are methods of synthesizing and using the disclosed precursors to deposit Titanium-containing films on one or more substrates via vapor deposition processes.
Claims17
A titanium-containing film forming composition comprising a titanium bromide-containing precursor having one of the following formula:
- TiXb:Ac
- with b=3 or 4;
- c=1-3;
- X=Br;
- A=SR2, SeR2, TeR2, or PR3, and each R is independently H or a C1-C5 hydrocarbon, wherein the Ti bromide-containing precursor is a liquid at standard temperature and pressure.
2 more elements
Dependencies are inferred from the claim text.