Method and system for fabricating a microelectromechanical system device with a movable portion using anodic etching of a sacrificial layer

A method for fabricating a microelectromechanical system device comprising:

• submerging a microelectromechanical system device in deionized water, wherein the microelectromechanical system device includes a chromium layer deposited on a surface of a substrate, between a portion of a structural layer that is to be freed for movement and a base;
• submerging an electrode in the deionized water to provide a negative bias;
• applying a positive bias voltage to the chromium layer, causing the chromium layer to dissolve in the deionized water;
• and
• wherein the bias voltage is 30 volts.

A system comprising:

• a solution of water;
• a microelectromechanical system device including a sacrificial layer of chromium deposited between a portion of a structural layer and a base, wherein the microelectromechanical system device is submerged in the solution of water;
• an electrode submerged in the water, wherein the electrode provides a negative bias;
• and
• a voltage source providing a positive bias to the sacrificial layer of chromium to anodically etch the sacrificial layer of chromium and free the portion of the structural layer of the microelectromechanical system device for movement.