Apparatus with concentric pumping for multiple pressure regimes

A processing chamber comprising:

• a chamber body defining a processing region and configured to generate a plasma therein;
• a substrate support assembly disposed in the process region;
• and
• an exhaust module comprising:
• a body coupled to the chamber body, the body having a first vacuum pump opening and a second vacuum pump opening formed therethrough;
• a pumping ring positioned in the body over both the second vacuum pump opening and the vacuum pump opening, the pumping ring comprising:
• a substantially ring shaped body, comprising:
• a top surface and a bottom surface, the top surface having one or more through holes formed therein, wherein the one or more through holes are arranged in a pattern concentric with the first vacuum pump opening and the bottom surface having a fluid passage formed therein fluidly isolated from the first vacuum pump opening, the fluid passage interconnecting each of the one or more through holes to the second vacuum pump opening;
• and
• an opening formed in the substantially ring shaped body, the opening substantially aligned with the first vacuum pump opening;
• and
• a symmetric flow valve positioned in the body over the pumping ring, the symmetric flow valve movable between a raised position allowing for passage through the opening of the substantially ring shaped body and into the vacuum pump opening and a lowered position substantially sealing the opening of the substantially ring shaped body without sealing the one or more through holes.