Transparent substrate with antireflective film having specified luminous transmittance and luminous reflectance

An antireflective-film attached transparent substrate, comprising a transparent substrate having two principal surfaces and an antireflective film formed on one of the principal surfaces of the transparent substrate,

• wherein the antireflective-film attached transparent substrate has a luminous transmittance being in a range of 20% to 84% and a b* value of a transmission color being 5 or smaller under a D65 light source, and
• wherein the antireflective film has a luminous reflectance being 1% or lower and a sheet resistance being 104Ω/□ or higher,
• wherein the antireflective film has a multilayer structure built up of at least two dielectric layers differing from each other in refractive index,
• each dielectric layer in the multilayer structure is constituted mainly of at least one oxide selected from the group consisting of oxides of Si, Nb, Ti, Zr, Ta, Al, Sn, and In or constituted mainly of at least one nitride selected from the group consisting of nitrides of Si and Al, and
• at least one layer of the antireflective film with the multilayer structure contains dispersed fine particles of at least one chemical species selected from the group consisting of Ag, Mo, W, Cu, Au, Pd, Pt, Ir, Ni, Co, Fe, Cr, C, TiC, SiC, TiN, and CrN.

An antireflective-film attached transparent substrate, comprising a transparent substrate having two principal surfaces and an antireflective film formed on one of the principal surfaces of the transparent substrate,

• wherein the antireflective-film attached transparent substrate has a luminous transmittance being in a range of 20% to 84% and a b* value of a transmission color being 5 or smaller under a D65 light source, and
• wherein the antireflective film has a luminous reflectance being 1% or lower and a sheet resistance being 104Ω/□ or higher,
• wherein the antireflective film has a multilayer structure built up of at least two layers differing from each other in refractive index,
• at least one layer of the layers in the multilayer structure is constituted mainly of silicon oxide,
• at least another layer of the layers in the multilayer structure is constituted mainly of a mixed oxide of at least one oxide selected from the group A consisting of oxides of Mo and W and at least one oxide selected from the group B consisting of oxides of Si, Nb, Ti, Zr, Ta, Al, Sn, and In, and
• the proportion of the content of the oxide of the group B to the total content of the oxide of the group A and the oxide of the group B in the mixed oxide is lower than 50% by mass.