Display substrate with uniform gate insulation structure

A method of manufacturing a display substrate, comprising:

• providing a substrate;
• and
• forming a thin film transistor on a first surface of the substrate, the thin film transistor comprising an electrode and an insulating layer, and the insulating layer covering the electrode;
• wherein a groove is formed on a surface of the insulating layer away from the electrode, and an orthogonal projection of a bottom wall of the groove on the substrate overlaps with an orthogonal projection of the electrode on the substrate, and
• wherein forming the thin film transistor further comprises:
• forming a first gate insulating layer on the first surface of the substrate, wherein a first trench is formed on the first gate insulating layer;
• filling a liquid metal in the first trench to form a gate electrode, wherein the gate electrode has a height not greater than a depth of the first trench;
• and
• forming a second gate insulating layer on a side of the gate electrode and the first gate insulating layer away from the substrate, wherein the groove is formed on a surface of the second gate insulating layer away from the first gate insulating layer.

A display panel, comprising:

• a display substrate, wherein the display substrate comprises:
• a substrate;
• and
• a thin film transistor, provided on a first surface of the substrate and comprising an electrode and an insulating layer, the insulating layer covering the electrode,
• wherein a groove is formed on a surface of the insulating layer away from the electrode, and an orthogonal projection of a bottom wall of the groove on the substrate overlaps with an orthogonal projection of the electrode on the substrate, and
• wherein the insulating layer comprises:
• a first insulating layer, wherein a trench is provided on the first insulating layer, the electrode is provided in the trench, and the electrode has a height not greater than a depth of the trench;
• and
• a second insulating layer, provided on a side of the first insulating layer away from the substrate and covering the electrode and the first insulating layer, wherein the groove is formed on a surface of the second insulating layer away from the first insulating layer.

A display device, comprising:

• a display panel, wherein the display panel comprises:
• a display substrate, wherein the display substrate comprises:
• a substrate;
• and
• a thin film transistor, provided on a first surface of the substrate and comprising an electrode and an insulating layer, the insulating layer covering the electrode,
• wherein a groove is formed on a surface of the insulating layer away from the electrode, and an orthogonal projection of a bottom wall of the groove on the substrate overlaps with an orthogonal projection of the electrode on the substrate, and
• wherein the insulating layer comprises:
• a first insulating layer, wherein a trench is provided on the first insulating layer, the electrode is provided in the trench, and the electrode has a height not greater than a depth of the trench;
• and
• a second insulating layer, provided on a side of the first insulating layer away from the substrate and covering the electrode and the first insulating layer, wherein the groove is formed on a surface of the second insulating layer away from the first insulating layer.