Maintenance method of plasma processing apparatus
AssigneeTokyo Electron Limited
InventorsKazuya Matsumoto, Yuki Hosaka, Mitsunori Ohata, Takashi Yamamoto
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AssigneeTokyo Electron Limited
InventorsKazuya Matsumoto, Yuki Hosaka, Mitsunori Ohata, Takashi Yamamoto
Estimating the term…
A plasma processing apparatus includes a support structure configured to support a workpiece and a first drive device configured to rotate the support structure about a first axis extending in a direction orthogonal to a vertical direction. The support structure includes a holding unit including an electrostatic chuck and a container provided under the holding unit. The container includes a tubular container body, and a bottom cover configured to close a bottom side opening of the container body and to be detachable from the container body. A maintenance method includes: rotating a support structure about a first axis such that the bottom cover is positioned above an electrostatic chuck, removing the bottom cover from the container body, and maintaining a component provided in the container body.
A maintenance method of a plasma processing apparatus for performing a plasma processing on a workpiece,
A maintenance method of a plasma processing apparatus,
Dependencies are inferred from the claim text.