Plasma processing apparatus

A plasma processing apparatus comprising:

• a vacuum processing chamber for processing a specimen;
• a dielectric window forming an upper face of the vacuum processing chamber;
• a gas supply device for introducing a gas into the vacuum processing chamber;
• a specimen table arranged in the vacuum processing chamber to place thereon the specimen;
• an induction coil arranged above the dielectric window;
• a Faraday shield arranged between the induction coil and the dielectric window to adjust an electric field generated by the induction coil, the Faraday shield being formed of a conductor;
• and a radio-frequency power supply for supplying a radio-frequency power to the induction coil and the Faraday shield, wherein one or more power feeding portions of the induction coil overlap each other in a circumferential direction, the Faraday shield includes a plurality of slits, each of which is arranged in a radial pattern and each of which opens at a same radial distance from a center of the Faraday shield, and wherein a single shorter slit faces an overlapping power feeding portion of the induction coil in a radial direction of the single shorter slit, and wherein a length of the single shorter slit which is opposed to the one or more power feeding portions of the induction coil is shorter than a length of all the other slits of the plurality of slits such that the conductor of the Faraday shield is located underneath the overlapping power feeding portion at a radially outer end of the single shorter slit.