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US 10,541,112 B2Granted
Charged particle beam system and method of operating the same
AssigneesCarl Zeiss Microscopy GmbH, Applied Materials Israel Ltd.
InventorsStefan Schubert, Thomas Kemen, Rainer Knippelmeyer
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Abstract
A charged particle beam system comprises a particle beam source having a particle emitter at a first voltage, a first electrode downstream of the particle beam source at a second voltage, a multi-aperture plate downstream of the first electrode, a second electrode downstream of the multi-aperture plate at a third voltage, a third electrode downstream of the second electrode at a fourth voltage, a deflector downstream of the third electrode, an objective lens downstream of the deflector, a fourth electrode downstream of the deflector at a fifth voltage; and an object mount at a sixth voltage. Voltage differences between the first, second, third, fourth and fifth voltages have same and opposite signs.
Claims34
A charged particle beam system, comprising:
- a particle beam source configured to generate a particle beam wherein the particle beam source includes a particle emitter;
- a first electrode downstream of the particle beam source;
- a multi-aperture plate downstream of the first electrode;
- a second electrode downstream of the multi-aperture plate;
- a third electrode downstream of the second electrode;
- a deflector downstream of the third electrode;
- an objective lens downstream of the deflector;
- a fourth electrode downstream of the deflector;
- and
- an object mount configured to mount an object such that a surface of the object is located downstream of the objective lens;
- a voltage supply configured to maintain
- the particle emitter at a first voltage;
- the first electrode and/or the multi-aperture plate at a second voltage;
- the second electrode at a third voltage;
- the third electrode at a fourth voltage;
- the fourth electrode at a fifth voltage;
- and
- object mount at a sixth voltage;
- wherein
- an absolute value of a first difference between the first voltage and the second voltage is greater than a first voltage amount;
- an absolute value of a second difference between the second voltage and the third voltage is greater than the first voltage amount;
- an absolute value of a third difference between the third voltage and the fourth voltage is greater than the first voltage amount;
- an absolute value of a fourth difference between the fourth voltage and the fifth voltage or the sixth voltage is greater than the first voltage amount;
- the first difference and the second difference have a same sign;
- the third difference and the fourth difference have a same sign;
- and
- the first difference and the third difference have opposite signs.
24 more elements
A charged particle beam system, comprising:
- a particle beam source configured to generate a particle beam wherein the particle beam source includes a particle emitter;
- a first electrode downstream of the particle beam source;
- a multi-aperture plate downstream of the first electrode;
- a second electrode downstream of the multi-aperture plate;
- a third electrode downstream of the second electrode;
- a deflector downstream of the third electrode;
- an objective lens downstream of the deflector;
- a fourth electrode downstream of the deflector;
- and
- an object mount configured to mount an object such that a surface of the object is located downstream of the objective lens;
- a voltage supply configured to maintain
- the particle emitter at a first voltage;
- the first electrode and/or the multi-aperture plate at a second voltage;
- the second electrode at a third voltage;
- the third electrode at a fourth voltage;
- the fourth electrode at a fifth voltage;
- and
- object mount at a sixth voltage;
- wherein
- an absolute value of a first difference between the first voltage and the second voltage is greater than a first voltage amount;
- an absolute value of a second difference between the second voltage and the third voltage is greater than the first voltage amount;
- an absolute value of a third difference between the third voltage and the fourth voltage is greater than the first voltage amount;
- an absolute value of a fourth difference between the fourth voltage and the fifth voltage or the sixth voltage is greater than the first voltage amount;
- the first difference and the third difference have a same sign;
- the second difference and the fourth difference have a same sign;
- and
- the first difference and the second difference have opposite signs.
24 more elements
A charged particle beam system, comprising:
- a particle beam source configured to generate a particle beam wherein the particle beam source includes a particle emitter;
- a first electrode downstream of the particle beam source;
- a second electrode downstream of the first electrode;
- a third electrode downstream of the second electrode;
- a multi-aperture plate downstream of the third electrode;
- a deflector downstream of the third electrode;
- an objective lens downstream of the deflector;
- a fourth electrode downstream of the deflector;
- and
- an object mount configured to mount an object such that a surface of the object is located downstream of the objective lens;
- a voltage supply configured to maintain
- the particle emitter at a first voltage;
- the first electrode and/or the second electrode at a second voltage;
- the third electrode at a third voltage;
- the multi-aperture plate at a fourth voltage;
- the fourth electrode at a fifth voltage;
- and
- object mount at a sixth voltage;
- wherein
- an absolute value of a first difference between the first voltage and the second voltage is greater than a first voltage amount;
- an absolute value of a second difference between the second voltage and the third voltage is greater than the first voltage amount;
- an absolute value of a third difference between the third voltage and the fourth voltage is greater than the first voltage amount;
- an absolute value of a fourth difference between the fourth voltage and the fifth voltage or the sixth voltage is greater than the first voltage amount;
- the first difference and the second difference have a same sign;
- the third difference and the fourth difference have a same sign;
- and
- the first difference and the third difference have opposite signs.
24 more elements
A charged particle beam system, comprising:
- a particle beam source configured to generate a particle beam wherein the particle beam source includes a particle emitter;
- a first electrode downstream of the particle beam source;
- a second electrode downstream of the first electrode;
- a multi-aperture plate downstream of the second electrode;
- a deflector downstream of the multi-aperture plate;
- an objective lens downstream of the deflector;
- a third electrode downstream of the deflector;
- and
- an object mount configured to mount an object such that a surface of the object is located downstream of the objective lens;
- a voltage supply configured to maintain
- the particle emitter at a first voltage;
- the first electrode at a second voltage;
- the second electrode at a third voltage;
- the multi-aperture plate at a fourth voltage;
- the third electrode at a fifth voltage;
- and
- object mount at a sixth voltage;
- wherein
- an absolute value of a first difference between the first voltage and the second voltage is greater than a first voltage amount;
- an absolute value of a second difference between the second voltage and the third voltage is greater than the first voltage amount;
- an absolute value of a third difference between the third voltage and the fourth voltage is greater than the first voltage amount;
- an absolute value of a fourth difference between the fourth voltage and the fifth voltage or the sixth voltage is greater than the first voltage amount;
- the first difference and the third difference have a same sign;
- the second difference and the fourth difference have a same sign;
- and
- the first difference and the second difference have opposite signs.
23 more elements
Dependencies are inferred from the claim text.