Distortion measurement method for electron microscope image, electron microscope, distortion measurement specimen, and method of manufacturing distortion measurement specimen

An electron microscope configured to measure a distortion of an electron microscope image, the electron microscope comprising:

• an image acquiring section that acquires an electron microscope image of a distortion measurement specimen having structures arranged in a lattice;
• a distortion measuring section that measures a distortion from the electron microscope image of the distortion measurement specimen, wherein the distortion comprises changes in an aspect ratio of the obtained electron microscope image;
• and
• an auto-correlation function calculating section that calculates an auto-correlation function of the electron microscope image of the distortion measurement specimen;
• wherein the distortion measuring section measures the distortion based on a pattern formed by connecting peak positions of the auto-correlation function, wherein the pattern is an ellipse.

A distortion measurement specimen for measuring a distortion of an electron microscope image, the distortion measurement specimen comprising:

• a substrate;
• a pattern-formed layer supported by the substrate and including through-holes arranged in a lattice, wherein the pattern-formed layer is formed on a first surface of the substrate;
• a first conductive layer;
• and
• a second conductive layer;
• wherein a portion of the pattern-formed layer is sandwiched between the first conductive layer and the second conductive layer, wherein the portion includes the through-holes and the through-holes penetrate the first conductive layer, the pattern-formed layer, and the second conductive layer.

A method of manufacturing a distortion measurement specimen for measuring a distortion of an electron microscope image, the method comprising:

• preparing a substrate;
• forming a first layer on a first surface of the substrate;
• forming structures arranged in a lattice by patterning the first layer;
• etching a second surface on an opposite side to the first surface of the substrate to remove the substrate;
• forming a first conductive layer on an upper surface of the first layer, wherein the first conductive layer comprises a conductive material;
• and
• forming a second conductive layer on a lower surface of the first layer, wherein the first conductive layer comprises a conductive material.

A distortion measurement method for an electron microscope image, the method comprising:

• measuring a distortion of an electron microscope image by using an electron microscope image of a distortion measurement specimen, wherein the distortion measurement specimen comprises:
• a substrate, and
• a pattern-formed layer supported by the substrate and including structures arranged in a lattice;
• calculating an auto-correlation function of the electron microscope image of the distortion measurement specimen;
• and
• measuring the distortion based on a pattern formed by connecting peak positions of the auto-correlation function, wherein the pattern is an ellipse.